What Is Wet Bench Process

This provides a wide range of movement controls to accommodate various process needs.

What is wet bench process.

A burt process equipment custom designed wet bench or wet process station is a fully integrated system that has many applications from pharmaceutical testing medical labs hospital college and university laboratories school science centers semiconductor processes metal finishing laboratory testing and ultrasonic cleaning. They can be designed for acid or solvent processing. What is a wet bench. Wafer processing requires specialized work stations called wet chemistry benches.

They are also used to prepare a wafers surface for the next step in the overall process. The processing uses specific equipment and a series of chemicals to clean etch mask deposit rinse and dry creating the combination of patterned layers that will eventually become electronic chips. Fully automated wet benches are the most expensive of the three but also the most extensive in design. The spm sulfuric peroxide mix clean process uses a solution of approximately 3 parts sulfuric acid to 1 part of hydrogen peroxide at about 130 degrees centigrade to strip organic material and photoresist from silicon wafers quickly and effectively.

Since there are so many different processes that can be done using the wet benches this document is intended as a set of general instructions not a step by step manual. Semiconductor fabrication is a complex process and it can take as long as eight weeks or more to complete a manufacturing cycle. Overview of wet process bench fab 3559 wb wet benches are used in a wafer fab to clean debris and or to etch away unwanted or no longer needed films from wafers. Wet bench wetdecks wet process process baths or sinks are terms used in semiconductor manufacturing to describe the machine or machines used to sequentially process a batch of wafers or single wafers through a variety of chemical steps.

Your safety is your responsibility. The systems are designed to accommodate one each 300mm cassette with twenty five wafers or one each 450mm wafer cassette with thirteen or twenty five wafers to provide broader process capabilities. Modutek s semi automated wet benches are servo controlled with 3 degrees of freedom which gives you precise developing etching and cleaning processes. Complete with solidworks simulation professional and solidworks flow simulation software these wet benches complete most tasks with ease.

This document provides guidelines for the use of the wet benches in the csser cleanroom. Dry to dry wet benches eliminate the need to dry in separate tools. Wet bench standard operating procedures purpose. Semiconductor manufacturing involves multiple processing steps which includes cleaning silicon wafers using wet bench technology.